Lithography-aware Bridging Fault Diagnosis to Identify the Layer of Systematic Defects

• Main Authors: Wei-Li Hsu, 徐偉力
• Other Authors: 李建模
• Format: Others
• Language: en_US
• Published: 2011
• Online Access: http://ndltd.ncl.edu.tw/handle/72470045355182488207

碩士 === 國立臺灣大學 === 電子工程學研究所 === 100 === Volume diagnosis to identify systematic defects is important for yield learning in modern nanometer technologies.The impact of lithography has become more and more critical to the yield because of increasing design complexity and shrinking technology nodes.Existing volume diagnosis techniques do not consider the lithography information. Therefore, this thesis proposes a volume diagnosis technique that considers the lithography information and uses statistical analysis, Z-test, to identify the layer of systematic defects (LSD) for bridging faults.The experiments successfully diagnoseall LSDs for single bridging fault as well as multiple bridging faultswhen three-detect test patterns are applied. It also shows that N-detect test patterns help to improve the diagnosis results.