Lithography-aware Bridging Fault Diagnosis to Identify the Layer of Systematic Defects
碩士 === 國立臺灣大學 === 電子工程學研究所 === 100 === Volume diagnosis to identify systematic defects is important for yield learning in modern nanometer technologies.The impact of lithography has become more and more critical to the yield because of increasing design complexity and shrinking technology nodes.Exis...
Main Authors: | Wei-Li Hsu, 徐偉力 |
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Other Authors: | 李建模 |
Format: | Others |
Language: | en_US |
Published: |
2011
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Online Access: | http://ndltd.ncl.edu.tw/handle/72470045355182488207 |
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