Layout Decomposition for Triple Patterning Lithography
碩士 === 國立臺灣大學 === 電子工程學研究所 === 100 === Double patterning lithography (DPL) has been widely recognized as one of the most promising solutions for the sub-22nm technology node to enhance pattern printability. However, much of the literature from industry states that, for the 15nm technology node and b...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/12296490883899231236 |