The Preparation of OLED Encapsulation Barrier Layer by Low-Temperature PECVD-A Study on the SiOxNy Film Parameter Optimization
碩士 === 國立臺灣科技大學 === 自動化及控制研究所 === 100 === This study applied low temperature PEVCD (Plasma-Enhanced Chemical Vapor Deposition) in the preparation of SiOxNy film in OLED (Organic Light-Emitting Diode) encapsulation process to prevent the intrusion of water vapor and oxygen to prolong the light-emitti...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/36321935283636541748 |