Nitrogen doped ZnO thin films prepared by anode layer ion source reactive ion beam sputter deposition
碩士 === 國立臺灣科技大學 === 電子工程系 === 100 === Nitrogen doped ZnO (ZnO:N) thin films have been deposited by reactive ion beam sputter deposition utilizing an anode layer ion source. Both argon and nitrogen were passed simultaneously through the ion source to act as sputtering and reactive ion species, respe...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/qtya6e |