Improved Electrical and Reliability Characteristics of Metal-Oxide-Semiconductor Capacitors with HfLaO Dielectrics using Laser Annealing with Various Frequencies

碩士 === 國立虎尾科技大學 === 機械與機電工程研究所 === 100 === In this thesis, the improved electrical and reliability characteristics of metal-oxide- semiconductor (MOS) capacitors with HfLaO dielectrics using laser annealing with were who’s demonstrated frequence. The HfLaO dielectric was formed by the RF sputter. T...

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Bibliographic Details
Main Authors: Min-Cheng Luo, 羅敏誠
Other Authors: 鄭錦隆
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/3pd32w