Effect of Argon Gas Flow Rate on the Properties of Titanium Dioxide and Carbon Thin Film by Sputtering Method
碩士 === 南台科技大學 === 奈米科技研究所 === 100 === This study investigates the effect of argon gas flow rate on the properties of Titanium Dioxide and Carbon thin film by sputtering method. The studied items are analyzing :（I）the effect of argon gas flow rate on the thin film deposition rate;（II）the photocatalys...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
101
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| Online Access: | http://ndltd.ncl.edu.tw/handle/18257193106430056122 |