The Study for Plasma Distribution Characteristic of Coating Chamber
碩士 === 國立臺北科技大學 === 能源與冷凍空調工程系碩士班 === 100 === The Plasma Enhanced Chemical Vapor Deposition (PECVD) is one of the important processes of electronic panel in the present semiconductor industry. In order to increase the production efficiency, this study discussed the plasma distribution in the chamber...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/8tec3a |