A Research Using QFD Model with Entropy Method for the Quality Control Evaluation of R&;D Software Development System in Semiconductor Manufacturing

碩士 === 元培科技大學 === 企業管理研究所 === 100 === With the rapid progress on wafer fabrication technology, the width of IC is shortened from micron-scaled level to nano-scaled level, and the device density of IC is more and more large. As wafer fabrication technology upgrades to a higher precision level, the se...

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Bibliographic Details
Main Authors: Hsuan-Yu Chang, 張軒瑜
Other Authors: Shu-Fan Liu
Format: Others
Language:zh-TW
Online Access:http://ndltd.ncl.edu.tw/handle/6t8dt8