Using Octafluorocyclobutane gas to etch silicon by atmospheric-pressure plasma jet
碩士 === 元智大學 === 化學工程與材料科學學系 === 100 === In this study, research effort was given to the study of atmospheric-pressure plasma etching with octafluorocyclobutane and tetrafluoromethane monomers. A capacitive coupled radio frequency (RF) double-pipe atmospheric-pressure plasma jet is used for the etchi...
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/84958572570779485487 |