Computational Geometry for IC Mask Layer Operations
碩士 === 元智大學 === 資訊工程學系 === 100 === As device feature size migrates to nanometer scale, the lithography technique of chip manufacturing encounters tough challenges. Photo lithography is one of the most important stages in IC manufacturing process. To improve the resolution during lithography, many im...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/72690867584286238065 |