Characteristics of Low-temperature Deposited ZnO:N Thin Films on Various Substrates
碩士 === 大葉大學 === 電機工程學系 === 101 === In this study, ZnO:N thin films on Si, polyimide, and glass substrates were fabricated by the rf magnetron sputtering system. In the first phase, films were deposited under the working pressure hold on 40 mtorr with rf power 100 W. The working gas were mixed with...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/94884890264200375521 |