Resistive Switching Characteristics of SiO2-Based Resistive Memory by Different Plasma Treatments

碩士 === 國立高雄應用科技大學 === 電子工程系碩士班 === 101 ===   Cu/SiO2/Pt structures were fabricated to investigate their resistive switching behavior. The switching mechanism can be explained by a Cu filament model with the electrochemical reaction. The formation/rupture of a Cu filament was determined by dissolutio...

Full description

Bibliographic Details
Main Authors: Tsai, Yueh-Ying, 蔡岳穎
Other Authors: Liu, Chih-Yi
Format: Others
Language:zh-TW
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/aa3kxn