The Effect of AlN Layer on the Electrical Properties of Ni-Cr-Si-Al Thin Film by DC Magnetron Sputtering

碩士 === 國立高雄應用科技大學 === 機械與精密工程研究所 === 101 === In this study, aluminum nitride and nickel-chromium-silicon- aluminum thin films are prepared using DC magnetron sputtering deposition, respectively. To obtain different compositions of AlN thin film, the sputtering conditions are adjusted such as sputter...

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Bibliographic Details
Main Authors: Bing-Fu Tsai, 蔡秉富
Other Authors: Ming-Hung Lin
Format: Others
Language:zh-TW
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/89392747959657533480