Investigation on Plasma Diagnostics and Process Feed-back Control of CrNx Films During Reactive High Power Impulse Magnetron Sputtering
碩士 === 明道大學 === 材料科學與工程學系碩士班 === 101 === In this study, the Chromium nitride (CrNx) thin films were fabricated by high power impulse magnetron sputtering (HiPIMS). And the Cr emission intensity spectra were monitored by in-situ optical emission spectroscope (OES). To ensure that the CrN film was dep...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/85253496717392197228 |