A study on that tetramethylammonium hydroxide degradated to be trimethylamine causes corrosion of copper film
碩士 === 明新科技大學 === 化學工程與材料科技研究所 === 101 === Strongly alkaline tetramethylammonium hydroxide (TMAH) solution is typically used in the semiconductor manufacturing process dry or liquid-type photosensitive resist removal. Removal of the photoresist when tetramethylammonium hydroxide stripper was raised...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/30786750529558992373 |