Genetic Algorithm Approaches to Dispatch Rule for Wet Clean Station in Wafer Foundry

• Main Authors: Po-Yu Hsia, 夏柏喻
• Other Authors: Wei-Tai Wong
• Format: Others
• Language: zh-TW
• Published: 2013
• Online Access: http://ndltd.ncl.edu.tw/handle/25998607916557405013

碩士 === 明志科技大學 === 工業工程與管理研究所 === 101 === This paper studies the scheduling problem in the wet cleaning station (a part of the diffusion process) in a wafer foundry. The wet cleaning station operates in batch of 50 wafers, the cleaning process consists of various sinks between stations and is a Jumping No-Wait flowshop. The dispatching rule must take the next stage into consideration as well. The batch size for that process in 125 wafers and with queue time constraint to minimize the exposure to the air. Nonlinear integer programming was first applied to minimize makespan, but this approach could not meet the timeliness requirement of real applications. Thus genetic algorithm is applied in this study to search for optimal or near-optimal solutions. The result indicates that the genetic algorithm could find near-optimal solution much faster, and the solution is superior (in terms of makespan) to the existing practice.