The Influence of Etch Parameters on Silicon Shallow Trench profile
碩士 === 國立中興大學 === 材料科學與工程學系所 === 101 === Due to the demand of large data processing, the low power consumption, high process speed and high capacitor of memory are increasing drastically. For this purpose, it is necessary to shrink the chip size of dynamic random access memory (DRAM) and improve th...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/36352918218859481124 |