Investigation on Material Removal Process for Silicon Carbide Chemical Mechanical Polishing

碩士 === 國立勤益科技大學 === 機械工程系 === 101 === Silicon carbide (SiC) has excellent thermal conductivity, electrical conductivity, chemical stability and high wide band gap advantages, so it can become the next generation of high-temperature and high-power semiconductor devices, light-emitting device, high...

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Bibliographic Details
Main Authors: Jun-Kai Wang, 王俊凱
Other Authors: Ming-Yi Tsai
Format: Others
Language:zh-TW
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/68010260007126071718