Triangle Based Pattern Matching Method forProcess Hotspot Classification withDummification in EUVL
碩士 === 國立成功大學 === 資訊工程學系碩博士班 === 101 === As technology node advances, Extreme Ultraviolet Lithography (EUVL) is regarded as the most promising technology for improving the lithographic printability. However, there are still several challenges in EUVL like the most critical are e ect that causes patt...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/90336880190221551101 |