Triangle Based Pattern Matching Method forProcess Hotspot Classification withDummification in EUVL

• Main Authors: Che-WenChen, 陳哲文
• Other Authors: Tsung-Yi Ho
• Format: Others
• Language: en_US
• Published: 2013
• Online Access: http://ndltd.ncl.edu.tw/handle/90336880190221551101

碩士 === 國立成功大學 === 資訊工程學系碩博士班 === 101 === As technology node advances, Extreme Ultraviolet Lithography (EUVL) is regarded as the most promising technology for improving the lithographic printability. However, there are still several challenges in EUVL like the most critical are e ect that causes patterning distortions. As a result, dummy lls are added to a layout (i.e., dummi cation) to compensate the are e ect. Al-though dummy lls are used to alleviate the are e ect, process hotspots still cannot be fully eliminated and are essential to be detected in the early design stages. Pattern matching is one of the most popular and widely-used tech-niques to detect the process hotspots. However, existing pattern-matching-based algorithms may not e ectively detect all process hotspots under the consideration of dummi cation. In this thesis, we propose a two-stage triangle-based algorithm for process hotspot classi cation while considering the impact of dummi cation in EUVL. Experimental results show that our proposed algo-rithm is very e ective and e cient compared with the state-of-the-art process hotspot classi cation algorithm.