Studies of Novel Processing Technologies for Nano CMOS Device Applications
博士 === 國立成功大學 === 微電子工程研究所碩博士班 === 101 === This dissertation presents various skills; including a new STI (shallow trench isolation) etch method, small grain size with low temperature polygen process, post-nitridation annealing (PNA) and the carbon co-implant to promote nano CMOS device performances...
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| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/79175923032847322963 |