The studies of improving S/D residue
碩士 === 國立成功大學 === 電機工程學系專班 === 101 === To further improve the chip speed or the performance of the integrated circuit(IC), continuous shrinkage of the IC feature size is inevitable. However, in order to have a great yield on products, the nanometer size defects etched no longer can be ignored. In So...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/85042725710459721877 |