Analysis, Simulation, and Experimental Studies on Stress Behavior of PECVD Multi-Layer Structures after Thermal Cycling
碩士 === 國立成功大學 === 機械工程學系碩博士班 === 101 === Plasma-enhanced chemical vapor deposited (PECVD) dielectric films such as silicon nitride and silicon oxide have been widely used for passivation and inter-metal dielectrics. Multi-layer structures constructed by nitride and oxide films have been shown to hav...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/83861846128061987858 |