Design, Fabrication, and Characterization of Multilayer Mirrors for Extreme Ultra-Violet Lithography
碩士 === 國立交通大學 === 工學院加速器光源科技與應用碩士學位學程 === 101 === In this study, we designed and simulated characteristics of EUV multilayer mirrors by our developed program at National Chiao Tung University (NCTU) and commercial Essential Macleod software. In addition, we fabricated Mo/Si multilayer mirrors at Ins...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/38199268323781156005 |