Balancing Mask Density on Triple Patterning Lithography Aware Gridless Detailed Routing

碩士 === 國立交通大學 === 資訊科學與工程研究所 === 101 === For the sub-14nm technology node, triple patterning lithography (TPL) is adopted, which decomposes a single layer into three masks to increase pitch and enhance the resolution. In routing stage, considering TPL can improve the flexibility of layout decomposit...

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Bibliographic Details
Main Authors: Chi, Kai-Chih, 紀凱智
Other Authors: Li, Yih-Lang
Format: Others
Language:en_US
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/64569855320346299132