Robust control for chamber pressure system with dead-time in MOCVD process

碩士 === 國立交通大學 === 機械工程系所 === 101 === Light Emitting Diode (LED) was extensively used in recent years due to its low power consumption and long-life time. In the LED-related industries, the Metal Organic Chemical Vapor Deposition (MOCVD) is in common used for deposition GaN films on sapphire substrat...

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Main Authors:	Tang, Yuh-Che, 湯毓哲
Other Authors:	Lee, An-Chen
Format:	Others
Language:	zh-TW
Published:	2013
Online Access:	http://ndltd.ncl.edu.tw/handle/73821725552910268062

id	ndltd-TW-101NCTU5489105
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spelling	ndltd-TW-101NCTU54891052016-07-02T04:20:29Z http://ndltd.ncl.edu.tw/handle/73821725552910268062 Robust control for chamber pressure system with dead-time in MOCVD process 有延遲時間的MOCVD製程反應腔體內部壓力控制系統的強健控制 Tang, Yuh-Che 湯毓哲碩士國立交通大學機械工程系所 101 Light Emitting Diode (LED) was extensively used in recent years due to its low power consumption and long-life time. In the LED-related industries, the Metal Organic Chemical Vapor Deposition (MOCVD) is in common used for deposition GaN films on sapphire substrate. However, most chamber pressure system exist dead-time, nonlinearity and model uncertainty. In order to obtain a better process quality, in this thesis, we use system identific--ation (ID) to approach a suitable process model of chamber pressure system in MOCVD process, and applied Discrete Time Robust DOB controller with Dead-time compensation. Lee, An-Chen 李安謙 2013 學位論文 ; thesis 130 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 國立交通大學 === 機械工程系所 === 101 === Light Emitting Diode (LED) was extensively used in recent years due to its low power consumption and long-life time. In the LED-related industries, the Metal Organic Chemical Vapor Deposition (MOCVD) is in common used for deposition GaN films on sapphire substrate. However, most chamber pressure system exist dead-time, nonlinearity and model uncertainty. In order to obtain a better process quality, in this thesis, we use system identific--ation (ID) to approach a suitable process model of chamber pressure system in MOCVD process, and applied Discrete Time Robust DOB controller with Dead-time compensation.
author2	Lee, An-Chen
author_facet	Lee, An-Chen Tang, Yuh-Che 湯毓哲
author	Tang, Yuh-Che 湯毓哲
spellingShingle	Tang, Yuh-Che 湯毓哲 Robust control for chamber pressure system with dead-time in MOCVD process
author_sort	Tang, Yuh-Che
title	Robust control for chamber pressure system with dead-time in MOCVD process
title_short	Robust control for chamber pressure system with dead-time in MOCVD process
title_full	Robust control for chamber pressure system with dead-time in MOCVD process
title_fullStr	Robust control for chamber pressure system with dead-time in MOCVD process
title_full_unstemmed	Robust control for chamber pressure system with dead-time in MOCVD process
title_sort	robust control for chamber pressure system with dead-time in mocvd process
publishDate	2013
url	http://ndltd.ncl.edu.tw/handle/73821725552910268062
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Robust control for chamber pressure system with dead-time in MOCVD process

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