Development of Highly Conductive Hydrogenated Microcrystalline Silicon Oxide Doped Layers for Thin-Film Solar Cell Applications
碩士 === 國立交通大學 === 光電工程學系 === 101 === In this study, plasma-enhanced chemical vapor deposition (PECVD) was used to deposit hydrogenated microcrystalline silicon oxide (μc-SiOx:H) for thin-film solar cell applications. In hydrogenated amorphous silicon (a-Si:H) single-junction thin film solar cells, t...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/95443703504810324156 |