Bandgap Narrowing in High Dopant Tin Oxide and Stress Measurement of Flexible ITO Thin Film

博士 === 國立中央大學 === 化學工程與材料工程學系 === 101 === In order to reduce the resistivity of tin oxide thin film, antimony-doped tin oxide (SnO2:Sb, ATO) films have been deposited on glass substrates using atmospheric pressure chemical vapor deposition (APCVD) method. The precursors are mixed with SnCl4, SbCl5 a...

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Bibliographic Details
Main Authors: Yang-Yi Lin, 林揚益
Other Authors: Albert T. Wu
Format: Others
Language:en_US
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/62285773020319299707