Investigation of Low-Temperature Growth of Germanium Thin Films on Single Crystal Silicon
碩士 === 國立中央大學 === 光電科學與工程學系 === 101 === In this research, we use the electron cyclotron resonance chemical vapor deposition (ECR-CVD) to deposit high-crystallinity germanium thin films on single crystal silicon substrate, and investigate the structural properties of the films. Because of the higher...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/82866558116047720128 |