Noise Analysis on 28 nm High-k/Metal-Gate nMOSFETs

博士 === 國立清華大學 === 材料科學工程學系 === 101 === In this research, trap quantitative and qualitative properties in n-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) with different annealing sequences have been studied on the basis of low-frequency (1/f) noise and random telegraph noise (R...

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Bibliographic Details
Main Authors: Chiu, Hsu-Feng, 邱旭鋒
Other Authors: Chang, Yee-Shyi
Format: Others
Language:en_US
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/07776337490385586150

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