Study of Crystalline High- k Materials Combined With Rare-Earth Oxide Interfacial Layer as the Gate Dielectric for Ge MOS Capacitors
碩士 === 國立清華大學 === 工程與系統科學系 === 101
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/86890772763888071886 |