Oxidation Behavior of Vacuum Annealed TiZrN Thin Film
碩士 === 國立清華大學 === 工程與系統科學系 === 101 === The purpose of this study is to research the oxidation behavior for different composition TiZrN thin film at high temperature in vacuum. A series of TiZrN film were deposited on Si (001) substrates using unbalanced magnetron sputtering. Specimens were later ann...
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| Format: | Others |
| Language: | en_US |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/77532815498584608710 |