Photolithography Linewidth Modification by Pre-Strained Substrate
碩士 === 國立清華大學 === 奈米工程與微系統研究所 === 101 === Currently, the industry of semiconductor uses double-pattering and immersion lithography technique to achieve 22 nm manufacturing process. But according to its fundamental optical and material characteristics limitation, this two manufacturing process will f...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/56397003227068123111 |