A study on the morphological formation of semiconductor germanium after Plasma / Ion etching treatment
碩士 === 國立臺南大學 === 材料科學系碩士班 === 101 === In recent years, plasma or ion etching processing on the substrate surface has been widely used in academic research and industrial manufacturing. In this study, plasma and ion etching are divided into two parts. In plasma etching experiments, parallel plate el...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/24904423805788160994 |