Oxidation resistance and mechanical properties of Ta–Si–N coatings
碩士 === 國立臺灣海洋大學 === 材料工程研究所 === 101 === Ta–Si–N films were prepared using reactive direct current magnetron co-sputtering by individual Ta and Si targets in (Ar+N2) atmosphere. The N2/(N2+Ar) was fixed at 0.4. The work pressure fixed at 4.0×10-1 Pa, changing Ta target and Si target power. The T...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52782129426056282971 |