Process and analysis of NiO film with intentional dopants
碩士 === 國立臺灣海洋大學 === 光電科學研究所 === 101 === By placing metal plates on a NiO target of a RF magnetron sputtering system, we prepared NiO films intentionally doped with Cu, Ti, and Zn and measured their absorption, transmittance, and X-ray diffraction for characterizing their optical and structural prope...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/69505281066752782064 |