The research of process and applications of nickel oxide by atomic layer deposition
碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 101 === In recent years, nickel oxide has been intensively studied as a promising p-type semiconductor in wide range application. In this study, we utilized atomic layer deposition to prepare NiO thin films from Ni(amd) and H2O as precursors. From a variety of analy...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/81660050251996351130 |