Lithography Optimization for Sub-22 Nanometer Technologies
博士 === 國立臺灣大學 === 電子工程學研究所 === 101 === As integrated circuit (IC) process nodes continue to shrink to 22nm and below, the IC industry will face severe manufacturing challenges with conventional optical lithography technologies. According to the keynote speech at International Symposium on Physical D...
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| Format: | Others |
| Language: | en_US |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/91452054312255317999 |