Channel Engineering of Tunneling-Field-Effect Poly-Si Thin-Film Transistors

碩士 === 國立臺灣科技大學 === 電子工程系 === 101 === In the progress of the electronics industry, the scale down of conventional metal oxide semiconductor thin film transistor (MOSFET) will emerge some reliability problems, such as short-channel effect, hot- carrier effect, drain-induce barrier lowering (DIBL) and...

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Bibliographic Details
Main Authors: Chia-wei Hsu, 許家偉
Other Authors: Miin-Horng Juang
Format: Others
Language:en_US
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/71581049138535731102