Modeling of Silicon Thin Film Deposition in the Afterglow of Argon Plasma
碩士 === 國立臺灣科技大學 === 機械工程系 === 101 === The steady growth rate of silicon thin-film inside a low-pressure chamber, with silane and hydrogen as the working gases, is predicted. A three-dimensional model of the deposition process in the afterglow of argon plasma with 19 species, such as electron, ions,...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/07400410404581549596 |