On the Effect of Preparation Parameters onSputtered Conductive Carbon Thin Films
碩士 === 南台科技大學 === 機械工程系 === 101 === This study explores the fabrication of conductive carbon thin films, with thickness at 100 nm, on glass substrates by using radio frequency magnetron sputtering of a graphite target. The fixed parameters are target to substrate distance (5 cm), sputtering power (4...
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| Format: | Others |
| Language: | zh-TW |
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102
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| Online Access: | http://ndltd.ncl.edu.tw/handle/33244146613665750210 |