Real-time Monitoring Technology on the Condensable and Acid Molecular Contamination for 450 mm Wafer Carrier
碩士 === 國立臺北科技大學 === 能源與冷凍空調工程系碩士班 === 101 === The airborne molecular contamination (AMC) control has become an important issue since smaller and smaller integrated circuit (IC) linewidth is used in semiconductor products. During the process of wafer storage and transportation in front opening unifie...
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ndltd-TW-101TIT057030432019-05-15T21:02:30Z http://ndltd.ncl.edu.tw/handle/dr5s83 Real-time Monitoring Technology on the Condensable and Acid Molecular Contamination for 450 mm Wafer Carrier 450 mm晶圓傳送盒凝結性及酸性分子污染物即時監測技術 Cheng-Wei Yang 楊承偉 碩士 國立臺北科技大學 能源與冷凍空調工程系碩士班 101 The airborne molecular contamination (AMC) control has become an important issue since smaller and smaller integrated circuit (IC) linewidth is used in semiconductor products. During the process of wafer storage and transportation in front opening unified pods (FOUP), any AMC may pollute the wafer and decrease the defect-free rate. The AMC inside a FOUP might be reminder from the previous manufacturing process or the cross-contamination between wafers. Therefore, if the real-time AMC concentration inside a FOUP can be monitored to evaluate the cleanliness, the polluted FOUP can be discarded for loading wafer and prevent the decrease of defect-free rate. Many AMC monitoring methodologies which were used in the past have their own limitations, including difficult real-time monitoring, poor sensitivity, poor accuracy, complex operation, often breakdown, and high maintenance cost. It is essential to make AMC monitoring fast and easy on the wafer storage and transportation in FOUPs. Automatic real-time monitoring and easy operation of sample collecting are examples but not limited to meet the demands of AMC monitoring on ppb or ppt level to assure the integrity of manufacturing process. This research aims to measure hydrogen fluoride and toluene particles as main AMC in semiconductor manufacturing. The Cavity Ring-Down Spectroscopy (CRDS) was used for measuring hydrogen fluoride particles while the photoionization detector (PID) monitoring system was used for measuring toluene and related organic contaminant. The results showed that both CRDS and PID were highly sensitive and could measure the pollution index rapidly. In addition, the recovery time for the monitor was short that the indicator went back to zero within 10 minutes. Compared with other methods of measurements, CRDS and PID could finish more FOUPs monitoring within the same time period. 胡石政 2013 學位論文 ; thesis 43 zh-TW |
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碩士 === 國立臺北科技大學 === 能源與冷凍空調工程系碩士班 === 101 === The airborne molecular contamination (AMC) control has become an important issue since smaller and smaller integrated circuit (IC) linewidth is used in semiconductor products. During the process of wafer storage and transportation in front opening unified pods (FOUP), any AMC may pollute the wafer and decrease the defect-free rate. The AMC inside a FOUP might be reminder from the previous manufacturing process or the cross-contamination between wafers. Therefore, if the real-time AMC concentration inside a FOUP can be monitored to evaluate the cleanliness, the polluted FOUP can be discarded for loading wafer and prevent the decrease of defect-free rate.
Many AMC monitoring methodologies which were used in the past have their own limitations, including difficult real-time monitoring, poor sensitivity, poor accuracy, complex operation, often breakdown, and high maintenance cost. It is essential to make AMC monitoring fast and easy on the wafer storage and transportation in FOUPs. Automatic real-time monitoring and easy operation of sample collecting are examples but not limited to meet the demands of AMC monitoring on ppb or ppt level to assure the integrity of manufacturing process.
This research aims to measure hydrogen fluoride and toluene particles as main AMC in semiconductor manufacturing. The Cavity Ring-Down Spectroscopy (CRDS) was used for measuring hydrogen fluoride particles while the photoionization detector (PID) monitoring system was used for measuring toluene and related organic contaminant. The results showed that both CRDS and PID were highly sensitive and could measure the pollution index rapidly. In addition, the recovery time for the monitor was short that the indicator went back to zero within 10 minutes. Compared with other methods of measurements, CRDS and PID could finish more FOUPs monitoring within the same time period.
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author2 |
胡石政 |
author_facet |
胡石政 Cheng-Wei Yang 楊承偉 |
author |
Cheng-Wei Yang 楊承偉 |
spellingShingle |
Cheng-Wei Yang 楊承偉 Real-time Monitoring Technology on the Condensable and Acid Molecular Contamination for 450 mm Wafer Carrier |
author_sort |
Cheng-Wei Yang |
title |
Real-time Monitoring Technology on the Condensable and Acid Molecular Contamination for 450 mm Wafer Carrier |
title_short |
Real-time Monitoring Technology on the Condensable and Acid Molecular Contamination for 450 mm Wafer Carrier |
title_full |
Real-time Monitoring Technology on the Condensable and Acid Molecular Contamination for 450 mm Wafer Carrier |
title_fullStr |
Real-time Monitoring Technology on the Condensable and Acid Molecular Contamination for 450 mm Wafer Carrier |
title_full_unstemmed |
Real-time Monitoring Technology on the Condensable and Acid Molecular Contamination for 450 mm Wafer Carrier |
title_sort |
real-time monitoring technology on the condensable and acid molecular contamination for 450 mm wafer carrier |
publishDate |
2013 |
url |
http://ndltd.ncl.edu.tw/handle/dr5s83 |
work_keys_str_mv |
AT chengweiyang realtimemonitoringtechnologyonthecondensableandacidmolecularcontaminationfor450mmwafercarrier AT yángchéngwěi realtimemonitoringtechnologyonthecondensableandacidmolecularcontaminationfor450mmwafercarrier AT chengweiyang 450mmjīngyuánchuánsònghéníngjiéxìngjísuānxìngfēnziwūrǎnwùjíshíjiāncèjìshù AT yángchéngwěi 450mmjīngyuánchuánsònghéníngjiéxìngjísuānxìngfēnziwūrǎnwùjíshíjiāncèjìshù |
_version_ |
1719108041074278400 |