Application of pH-Sensitive Catalyst Ink on Electroless Copper Plating

碩士 === 國防大學理工學院 === 化學工程碩士班 === 102 === In this study, a pH-responsive palladium catalyst for electroless copper deposition was prepared. The noble metal nanoparticles reduced and stabilized by styrene monomer and 2-(N,N-dimethylamino)-ethyl methacrylate(DMAEMA) monomer by free radical polymerizati...

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Bibliographic Details
Main Authors: Chung-Ming Chu, 朱崇銘
Other Authors: Ming-Der Ger
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/73586523938153974567