The Channel Design of Hot-Wall MOCVD Chamber
碩士 === 中原大學 === 機械工程研究所 === 102 === The plug-flow is an ideal flow field in MOCVD chamber, but the temperature gradient between the susceptor and chamber is too large that vortex shows on the side of susceptor which decrease the unifomity of the film. If we can increase the temperature of chamber wa...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/4e5nc8 |