Characterization of Very High Frequency Plasma Source
碩士 === 逢甲大學 === 電子工程學系 === 102 === A plasma enhanced chemical vapor deposition (PECVD) is a very important technology for the fabrication of silicon thin film solar cells and semiconductor manufacturing process. In most of the PECVD devices, the operating frequency is 13.56 MHz. Recently industries...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/t4c7jg |