The Study on the Microstructure and Properties of In2O3:Cu, M (M=Mg, Ca, Sr) Thin Films
碩士 === 義守大學 === 材料科學與工程學系 === 102 === In this study, the In2O3: Cu target was prepared by using grinding, calcination, embryo-pressurization, and sintering processes. Then the RF magnetron sputtering is employed to deposit the In2O3: Cu thin film on the (0001) sapphire substrates. By changing the...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/76426a |