Device Isolation of Liquid Phase Oxidation on InGaAs/InAlAs Metamorphic High-Electron-Mobility Transistor

碩士 === 義守大學 === 電子工程學系 === 102 === The study demonstrated liquid phase oxidation (LPO) on device isolation of InGaAs/InAlAs metamorphic high-electron-mobility transistor (MHEMT). The fabrication of conventional field effect transistors exist a gate leakage current due to the gate metal contact over...

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Bibliographic Details
Main Authors: Houng-Wei Chen, 陳泓偉
Other Authors: Kuan-Wei Lee
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/52m3p3