Low-heating-rate Annealing in Improving Electrical and Optical Properties of In-line Sputtered Indium Tin Oxide films
碩士 === 崑山科技大學 === 電機工程研究所 === 102 === This work applied one in-line sputtering tool to deposit indium tin oxide (ITO) films.The ITO films were following annealed in vacuum with low-heating rate of 10℃/min or traditional heating rate of 18℃～25℃/min. Structural, electrical and optical properties of IT...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/24968349805525200763 |