The Properties of Depositing AlN Thin Film on Molybdenum Electrodes
碩士 === 國立高雄應用科技大學 === 電子工程系碩士班 === 102 === In this research, the (100) oriented AlN thin films were deposited on p-type (100) silicon substrate by RF magnetron sputtering applied on Film Bulk Acoustic wave Resonator (FBAR). Aluminum and Molybdenum are the top and bottom electrodes. A shear wave can...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/jmq247 |